Live Plenary, ALD Innovator Award, & Technical Sessions - Monday Presentation: Mikko Ritala, University of Helsinki, Robert Clark, TEL Technology Center‚ America‚ LLC, Hyun-Chul Choi, LG Display, South Korea, Frank Rosowski, BASF SE‚ Germany, Keren Kanarik, Lam Research, USA, 159 min 19 sec
Live Technical Sessions - Tuesday Presentation: Charles Winter, Wayne State University, USA, Jeff Schulpen, Eindhoven University of Technology‚ Netherlands, Saba Ghafourisaleh‚ University of Helsinki‚ Finland, Mikhail Krishtab, KU Leuven/Imec‚ Belgium, Karina Ashurbekova‚ CIC nanoGUNE BRTA‚ Spain, 115 min 58 sec
Live Technical Sessions - Wednesday Presentation: Noriaki Toyoda, Kota Uematsu, University of Hyogo‚ Japan, Nicholas Chittock, Eindhoven University of Technology, Netherlands, Rudy Wojtecki, IBM Research – Almaden, Jean-Sebastien Lehn, EMD Performance Materials, Jeffrey W. Elam, Argonne National Laboratory, 168 min 35 sec
Live Tutorial Session - Tuesday Presentation: Anjana Devi, Ruhr-Universität Bochum, Germany, Neil Dasgupta, University of Michigan, USA, Angel Yanguas-Gil, Argonne National Laboratory, USA, 213 min 17 sec
Live Tutorial Session - Wednesday Presentation: Annelies Delabie, imec, Belgium, Simon Elliott, Schrödinger, Ireland, Mark Kushner, University of Michigan, USA, 211 min 50 sec
Aspect-Ratio Dependence of Isotropic Thermal ALE and Mitigation Thereof Presentation: Andreas Fischer, Lam Research Corp., 14 min 25 sec
Mechanistic Insights into Thermal Dry Atomic Layer Etching of Metals and Alloys Presentation: Andrew Teplyakov, University of Delaware, 25 min 5 sec
A Novel Approach to Evaluate LEIS Data of 2D SnS2 to Quantify the First and Second Atomic Layer Coverage Presentation: Thomas Grehl, IONTOF GmbH, 10 min 38 sec
Exploring ALD 2D Chalcogenides Beyond MoS2 Presentation: Miika Mattinen, University of Helsinki, 29 min 48 sec
Highly Stable and Active Catalyst for Dry Reforming of Methane via Molecular Layer Deposition Approach Presentation: Piyush Ingale, Technische Universität Berlin, 16 min 57 sec
Top and Bottom Ta2O5 Topographical Selective Deposition on 3D structures by Plasma Enhanced Atomic Layer Deposition Presentation: Taguhi Yeghoyan, LTM-UGA, 14 min 15 sec
Cryo-ALE of SiO2 with C4F8 Physisorption: Process Understanding and Enhancement Presentation: Gaëlle Antoun, GREMI Université d'Orléans/CNRS, 12 min 48 sec
On the Fundamentals of ALD: The Importance of Getting the Picture Right Presentation: Riikka Puurunen, Aalto University, 15 min 17 sec
ABC-Type Pulsing for Improved ALD of Group 13 Nitrides using Trialkyl Metal Precursors Presentation: Henrik Pedersen, Linköping University, 14 min 31 sec
Mechanism of the HF Pulse in the Thermal Atomic Layer Etch of HfO2 and ZrO2: A First Principles Study Presentation: Rita Mullins, Tyndall National Institute, 10 min 35 sec
β-Silyl-Diamides and β-Silyl-Amidoamines Lead to Unusual Co(II & IV) Precursors Presentation: David Zanders, Ruhr University Bochum, 14 min 5 sec
Vapor Phase Infiltration for Transforming Polymers into Hybrid Materials: Mechanisms of Inorganic Entrapment and Structure-Property Implications Presentation: Mark Losego, Georgia Institute of Technology, 28 min 32 sec
When ALD Outperforms MOCVD: Direct Comparison of Epitaxial InN Films Presentation: Chih-Wei Hsu, Linköping University, 14 min 38 sec
Ultrathin TiN by Thermal ALD as Electrically Conducting Li-ion Diffusion Barrier for Integrated 3D Thin-Film Batteries Presentation: Jan Speulmanns, Fraunhofer IPMS, 15 min 11 sec
Design of Advanced Photocatalytic Materials by Atomic Layer Deposition (ALD) Presentation: Syreina Alsayegh, Institut Européen des Membranes, 12 min 52 sec
As Deposited Epitaxial Functional Complex Oxides - Enabling Novel Technology Presentation: Henrik H. Sønsteby, University of Oslo, 29 min 53 sec
Plasma Enhanced Spatial Atomic Layer Deposition of Silicon Nitride Using Di(isopropylamino)silane and N2 Plasma Presentation: Hisashi Higuchi, TEL Technology Center, America, LLC, 13 min 25 sec
Surface Functionalization and Atomic Layer Deposition of Metal Oxides on MoS2 Surfaces Presentation: Theodosia Gougousi, University of Maryland, Baltimore County, 13 min 48 sec
Gas Sensing Characteristics of MoxW1-xS2 Synthesized by Atomic Layer Deposition Presentation: Inkyu Sohn, Yonsei University, 12 min 33 sec
In-vitro Screening of Materials and Laminates by Atomic Layer Deposition for Medical Device Coatings Presentation: Tom Blomberg, Picosun Oy, 8 min 50 sec