Original air date: 6.8.22.
The USPTO is seeing high levels of improper behavior, including from attorneys representing applicants before the USPTO in trademark matters. Hear how the USPTO has responded to such behavior through the Trademarks Organization’s Administrative Sanctions Program as well as through the USPTO’s Office of Enrollment and Discipline investigation and disciplinary actions taken against U.S.-licensed counsel violating USPTO Rules of Practice, rules on signatures and certification, and Rules of Professional Conduct.
Presented by: Dahlia George and Amy Cotton of United States Patent and Trademark Office
AIPLA is an approved provider by most jurisdictions requiring CLE. Each program requires individual jurisdiction approval, and each jurisdiction has different approval guidelines and time frames so programs may not be pre-approved for CLE. Program accreditation is sought in all attendee requested jurisdictions and may be available for up to one year after the original air date. Specialized credits (Ethics, Elimination of Bias, Diversity, Equity & Inclusion, Technology, etc.) approval varies by jurisdiction. CLE reporting and/or certificates of attendance may take up to 4 weeks for processing.
For information on CLE accreditation and processing, please contact the AIPLA CLE Department at cle@aipla.org.
AIPLA is an approved provider by most jurisdictions requiring CLE. Each program requires individual jurisdiction approval, and each jurisdiction has different approval guidelines and time frames so programs may not be pre-approved for CLE. Program accreditation is sought in all attendee requested jurisdictions and may be available for up to one year after the original air date. Specialized credits (Ethics, Elimination of Bias, Diversity, Equity & Inclusion, Technology, etc.) approval varies by jurisdiction. CLE reporting and/or certificates of attendance may take up to 4 weeks for processing.
For information on CLE accreditation and processing, please contact the AIPLA CLE Department at cle@aipla.org.