FCMN 2009
30 Presentations
-
-
Invited Oral Presentation: Overview Of 3D Integration Requirements
-
Invited Oral Presentation: Synchrotron-Based Nanocharacterization
-
Invited Oral Presentation: Characterization of Integrated Nano Materials
-
Invited Oral Presentation: Research Challenges for CMOS Scaling: Industry Directions
-
Invited Oral Presentation: Metrology for Emerging Materials, Devices, and Structures: Graphene as an Example
-
Invited Oral Presentation: A 3D Stacked Nanowire Technology - Applications in Advanced CMOS and Beyond
-
Invited Oral Presentation: Boron Nanowires for Flexible Electronics and Field Emission
-
Invited Oral Presentation: Application of TOF-SIMS and LEIS for the Characterization of Ultra-Thin Films
-
Invited Oral Presentation: Mask Metrology - Current and Future Challenges
-
Invited Oral Presentation: Innovation: the 4th Factor of Production
-
Invited Oral Presentation: Dark-Field Holography for the Measurement of Strain at the Nanoscale
-
Invited Oral Presentation: Aberration-Corrected Electron Microscopy for Nanoelectronics Applications
-
Invited Oral Presentation: Nanoscale Measurement Methods for Novel Material Characterization
-
Invited Oral Presentation: Challenges and Opportunities for Modeling and Simulation
-
Invited Oral Presentation: Scanning Single Electron Transistor Microscopy on Graphene
-
Invited Oral Presentation: Nanotechnology: Impact on Metrology
-
Invited Oral Presentation: Simulations of Scatterometry Down to 22 nm Structure Sizes and Beyond
-
Invited Oral Presentation: Understanding Imaging and Metrology with the Helium Ion Microscope
-
Invited Oral Presentation: Nanoelectronics Landscape In Europe: New Opportunities for Research and Innovation
-
Invited Oral Presentation: Improved Resolution and New Analysis Capabilities
-
Invited Oral Presentation: Enabling Technologies for <20nm Generations
-
Invited Oral Presentation: Progress towards Low Vacuum Critical Dimension Metrology
-
Invited Oral Presentation: FINFET Doping: Fabrication and Metrology Challenges
-
Invited Oral Presentation: Scaling Effects on Ferro-Electrics: Application in Nanoelectronics and Characterization
