FCMN 2022
44 Presentations
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Plenary: Frontiers of Challenge = Opportunity for the Semiconductor Industry
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Invited Oral Presentation: A New Paradigm of Process Control Solutions for Advanced Semiconductor Devices
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Invited Oral Presentation: Advanced Manufacturing using Virtual Metrology and Equipment Intelligence
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Invited Oral Presentation: Latest Developments in X-ray Metrology for Semiconductor Structures
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Invited Oral Presentation: Time-Resolved Transmission Electron Microscopy from 1 Hz to 10 GHz in Stroboscopic Mode
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Invited Oral Presentation: New Developments in Atom Probe Tomography
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Invited Oral Presentation: Recent Advances in Electron Tomography and Applications in the Semiconductor Industry
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Invited Oral Presentation: Methods for Achieving Atomic-Scale Analytical Tomography
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Invited Oral Presentation: Ultra Low Energy SIMS Depth Profiling of 2D Materials
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Invited Oral Presentation: Photoelectron Spectroscopy in Device Technology: from XPS to HAXPES
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Invited Oral Presentation: Soft X-Ray Scatterometry: At-Resolution, 3D Metrology for the EUV Era
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Invited Oral Presentation: Extending Optical Critical Dimension Metrology into the Mid-Infrared Range
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Invited Oral Presentation: Fast and High-resolution Micro-XCT and Nano-XCT Imaging of Advanced Packaging Structures Using New X-ray Sources
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Invited Oral Presentation: In-situ Micro-DCB / Nano-XCT Test to Ensure the Robustness of Leading-edge Cu/ULK BEOL Stacks
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Invited Oral Presentation: Raman and PL for Nanoscale Materials Characterization and Metrology
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Invited Oral Presentation: Measurement Challenges for Scaling Superconductor-based Quantum Computers
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Invited Oral Presentation: Characterization of 2D Materials by ARPES at imec
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Invited Oral Presentation: TEM Imaging of Magnetic Domains, Memory Devices, etc.
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Poster Presentation: Thin EUV Photoresist Layers for Microelectronic Devices: Pivotal Benefits of the Orbitrap™ Mass Analyzer for Accurate Analysis
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Poster Presentation: Dopant Activation Evaluation in Si:P by Scanning Spreading Resistance Microscopy and Differential Hall Effect Metrology
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Poster Presentation: Comparison of Dopant Activation in Si as Characterized by Spreading Resistance Profiling (SRP) and Differential Hall Effect Metrology (DHEM)
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Poster Presentation: Improved Geometrical Correction in Micro Four-point Probe Measurements with Three Omega Correction
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Poster Presentation: Successes and Challenges in Applications of a Laboratory-Based Scanning XPS/HAXPES Instrument
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Poster Presentation: Characterization of Electronic Materials Using the PHI VersaProbe 4 Multi-Technique XPS Scanning Microprobe
