Elucidating the Mechanisms for Atomic Layer Growth through In Situ Studies Presentation: Jeffrey W. Elam, Argonne National Laboratory, 38 min 4 sec
Mapping the Future Evolution of Atomic Scale Processing to enable the World of Artificial Intelligence Presentation: Eric A. Joseph, IBM T.J. Watson Research Center, 48 min 22 sec
Atomic Layer Deposition on Pharmaceutical Particles for Inhaled Drug Delivery Presentation: Damiano La Zara, Delft University of Technology, Netherlands, 18 min 22 sec
The Use of Atomic Layer Deposition to Increase the Availability of Medical Radio-Isotopes Presentation: Ruud van Ommen, Delft University of Technology, Netherlands, 12 min 8 sec
Atomic Layer Deposition for Biosensing Applications Presentation: Matthieu Weber, Institut Européen des Membranes, France, 11 min 52 sec
Multi-layer Stacked ALD Coating for Hermetic Encapsulation of Implantable Biomedical Microdevices Presentation: Juhana Kostamo, Picosun Oy/ASM, Finland, 16 min 40 sec
Modification of Spaceflight Radiator Coating Pigments by Atomic Layer Deposition for Thermal Applications Presentation: Vivek Dwivedi, NASA Goddard Space Flight Center, 13 min 45 sec
Novel Atomic Layer Deposition Process/Hardware for Superconducting Films for NASA Applications Presentation: Frank Greer, Jet Propulsion Laboratory, 15 min 36 sec
Fluoride-based ALD Materials System for Optical Space Applications Presentation: John Hennessy, Jet Propulsion Laboratory, California Institute of Technology, 15 min 46 sec
Atomic Layer Deposition of Aluminum Fluoride for use in Astronomical Optical Devices Presentation: Alan Uy, University of Maryland, 14 min 32 sec
Nucleation Layer for Atomic Layer Deposition Enabling High Efficiency and Flexible Monolithic All-Perovskite Tandem Solar Cells Presentation: Axel F. Palmstrom, National Renewable Energy Laboratory, 14 min 21 sec
Perovskite Solar Cells Fabricated using Atomic Layer Deposited Doped ZnO as a Transparent Electrode Presentation: Louise Ryan, Tyndall National Institute, Ireland, 16 min 29 sec
Metal Oxide Barrier and Buffer Layers by Atomic Layer Deposition and Pulsed-Chemical Vapor Deposition for Semi-Transparent Perovskite Solar Cells Presentation: Helen Hejin Park, Korea Research Institute of Chemical Technology (KRICT), Republic of Korea, 15 min 46 sec
Particle Atomic Layer Deposition of Tungsten Nitride Environmental Barrier Coatings from Bis(t-butylimido)bis(dimethylamino)tungsten(VI) and Ammonia Presentation: Sarah Bull, University of Colorado - Boulder, 14 min 21 sec
Atomic Layer Deposition on Mg(BH4)2: A Route to Improved Automotive H2 storage Presentation: Noemi Leick, National Renewable Energy Laboratory, 12 min 56 sec
Plasmonic Mediated Hydrogen Desorption from Metal Hydrides Presentation: Katherine Hurst, National Renewable Energy Laboratory, 14 min 1 sec
Surface Modification of Solid Oxide Fuel Cell Cathodes by Atomic Layer Deposition Presentation: Dong Hwan Kim, Korea University, Republic of Korea, 13 min 52 sec
The Materials Supplier Challenge: Flawless Execution from Precursor Design to High Volume Manufacturing Presentation: Madhukar B. Rao, Versum Materials, 31 min 11 sec
Designing Thermal Atomic Layer Deposition Processes for Gold Metal using New Organogold Precursors and Co-reageants Presentation: Matthew Griffiths, Carleton University, Canada, 13 min 43 sec
A New Carbene Based Silver Precursor Applied in APP-ALD Yielding Conductive and Transparent Ag Films: A Promising Precursor Class for Ag Metal ALD Presentation: Nils Boysen, Ruhr University Bochum, Germany, 13 min 6 sec
Transition Metal β-ketoiminates: A Promising Precursor Class for Atomic Layer Deposition of Binary and Ternary Oxide Thin Films Presentation: Dennis Zywitzki, Ruhr University Bochum, Germany, 14 min 14 sec
A New and Promising ALD Process for Molybdenum Oxide Thin Films: From Process Development to Hydrogen Gas Sensing Applications Presentation: Jan-Lucas Wree, Ruhr University Bochum, Germany, 12 min 54 sec
Atomic Layer Deposition of Gallium Oxide Thin Films using Pentamethylcyclopentadienyl Gallium and Combinations of H2O and O2 Plasma Presentation: Fumikazu Mizutani, Kojundo Chemical Laboratory Co., Ltd., Japan, 18 min 9 sec