The Investigation of Al2O3 Passivation Characteristics in the Condition of Growth Temperature and Ozone Concentration Presentation: Young Joon Cho, Chungnam National University, Republic of Korea, 1 slide
Homogeneously Doped Atomic Layer Deposition Zinc Tin Oxide Thin Films for Improving Contact Resistance in Semiconductor Device Applications Presentation: Alex Ma, University of Alberta, Canada, 1 slide
High-Temperature Thermal Stability of ALD-TiN Metal Gate on In-situ Al2O3/Y2O3/(In)GaAs(001): Toward the Self-Aligned Gate-First Process Presentation: Lawrence Boyu Young, National Taiwan University, Republic of China, 1 slide
Identification of Interfacial Defect in ALD Grown Al2O3/GeOx/Ge Gate Stack Presentation: Jinjuan Xiang, Institute of Microelectronics of Chinese Academy of Sciences, China, 1 slide
Effect of Metal-insulator Interface on Dielectric Properties of Ultrathin Al2O3 and MgO Fabricated using In-situ Sputtering and Atomic Layer Deposition Presentation: Jagaran Acharya, The University of Kansas, 1 slide
Thermal and Plasma ALD Al2O3 Gate Insulator for GaN Electronic Devices Characterized by CV-Stress Measurements Presentation: Nicole Bickel, Ferdinand-Braun-Institut, Germany, 1 slide
Influence of Surface Cleaning Process on Initial Growth of ALD-Al2O3 and Electrical Properties of f Pt/Al2O3 /β-Ga2O3 MOS Capacitors Presentation: Masafumi Hirose, Shibaura Institute of Technology, Japan, 1 slide
Atomic Layer Deposition of IGZO Thin Films for BEOL Applications Presentation: Shóna Doyle, Tyndall National Institute, Ireland, 1 slide
High Voltage MIM Capacitor based on ALD Deposited Crystalline HfAlOx Film Presentation: Valentina Korchnoy, Technion - Israel Institute of Technology, Israel, 1 slide
Improved Performance of GaN Metal-Oxide-Semiconductor Capacitors by Plasma ALD of AlN Interlayer Presentation: Dilini Hemakumara, University of Glasgow, UK, 1 slide
High Performance Atomic Layer Deposition (ALD) of Gate Dielectrics for 4H-SiC Power Device Application Presentation: Adam Bertuch, Veeco-CNT, 1 slide
Effect of Al2O3 Passivation on n-type Si Solar Cell with Passivated Emitter and Rear Cell (PERC) Presentation: Kiryun Kim, Chungnam National University, Republic of Korea, 1 slide
High Quality CaF2 from a New ALD Process: Enabling New Approaches in Battery Technology and Optical Applications Presentation: Max Gebhard, Argonne National Laboratory, 1 slide
Properties of Molybdenum Oxide Deposited by Plasma Enhanced Atomic Layer Deposition for High Efficiency Solar Cells Presentation: Taewan Lim, Chungnam National University, Republic of Korea, 1 slide
Understanding and Mitigating F Migration in ALD Nanocomposite Coatings Presentation: Anil Mane, Argonne National Laboratory, 1 slide
Ultrathin Metal Oxide Passivation by Atomic Layer Deposition Enhances Stability and Performance of Visible Solar Water Splitting on Solution-Processed Organic Semiconductor Thin Films Presentation: Chang-Yong Nam, Brookhaven National Laboratory, 1 slide
Enhancement of Photovoltaic Efficiency using a Novel Nickel-4 Mercaptophenol Hybrid Interfacial Layer Presentation: Jinseon Park, Hanyang University, Republic of Korea, 1 slide
Enhancement of Photovoltaic Properties of Metal/III-V Schottky Solar Cells using Al2O3 Anti-Reflection and Passivation Layer Presentation: Ian Ferguson, Missouri University of Science and Technology, 1 slide
Investigation of ALD-grown i-ZnO Buffer Layer Properties for CIGS Solar Cell Application Presentation: Jeha Kim, Cheongju University, Republic of Korea, 1 slide
Atomic Layer Deposited Zirconium-doped ZnO Transparent Conductive Oxides for Silicon Solar Cells Presentation: Geedhika Kallidil Poduval, University of New South Wales, Australia, 1 slide
Atomic Layer Deposition of Few-Atom Cluster Arrays for Solar Fuel Catalysis Presentation: David Mandia, Argonne National Laboratory, 1 slide
Highly Dispersed Uniform Pt Catalysts on Carbon Support by Atomic Layer Deposition with Fluidized Bed Reactor(FBR). Presentation: Jung-Yeon Park, Hyundai Motor Group, Republic of Korea, 1 slide
Synthesis of Core Shell Nanocatalysts using Atomic Layer Deposition with Fluidized Bed Reactor for PEMFC Presentation: Seung-Jeong Oh, Hyundai Motor Group, Republic of Korea, 1 slide
ALD for Membrane Applications Presentation: Matthieu Weber, Institut Européen des Membranes, France, 1 slide