ALD-ALE 2019 Presentations
364 Presentations
0 Sections
2-Dimensional Perovskite Oxide Thin Films Deposited by ALD for High-k Application
Fabrication of Atomic Layer Deposited Alumina as Protective Coating of Silver
Diffusion Barrier Properties of ALD TiSiN Films
Atomic Layer Deposition of Carbon Doped Silicon Oxide and Effect of Thermal Treatment or Hydrogen Plasma Treatment on The Films
In-Situ Process Monitoring of Precursor Delivery Using Infra-Red Spectroscopic Method
Homogeneous and Stress Controlled PEALD Films for Large Optics
Atomic Precision Processing of Aluminum Mirrors for Enhanced Ultra-violet Optical Properties
Gallium ALD Precursor Development based on Mechanistic Study
Precursor and Co-Reactant Selection: A Figure of Merit
In-Situ Process Monitoring of Precursor Delivery Using Infra-Red Spectroscopic Method
Anisotropic Atomic Layer Etching of Tungsten using Reactive Ion Beam
ALD/ALE Process in Commercially Available Leading-Edge Logic and Memory Devices
