Variable Morphology Highly-Conformal Diffusion Barriers for Advanced Memory and Logic Applications Presentation: Hae Young Kim, Eugenus, Inc., 1 slide
2-Dimensional Perovskite Oxide Thin Films Deposited by ALD for High-k Application Presentation: Yan-Qiang Cao, Nanjing University, China, 1 slide
Fabrication of Atomic Layer Deposited Alumina as Protective Coating of Silver Presentation: Gwon Deok Han, Korea University, Republic of Korea, 1 slide
Atomic Layer Deposition of Carbon Doped Silicon Oxide and Effect of Thermal Treatment or Hydrogen Plasma Treatment on The Films Presentation: Meiliang Wang, Versum Materials, Inc., 1 slide
In-Situ Process Monitoring of Precursor Delivery Using Infra-Red Spectroscopic Method Presentation: Robert Wright, Entegris, Inc., 1 slide
Homogeneous and Stress Controlled PEALD Films for Large Optics Presentation: Hassan Gargouri, SENTECH Instruments GmbH, Germany, 1 slide
Atomic Precision Processing of Aluminum Mirrors for Enhanced Ultra-violet Optical Properties Presentation: Scott Walton, U.S. Naval Research Laboratory, 1 slide
Gallium ALD Precursor Development based on Mechanistic Study Presentation: Adam Hock, Illinois Institute of Technology, 1 slide
In-Situ Process Monitoring of Precursor Delivery Using Infra-Red Spectroscopic Method Presentation: Robert Wright, Entegris, Inc., 1 slide
ALD/ALE Process in Commercially Available Leading-Edge Logic and Memory Devices Presentation: Rajesh Krishnamurthy, TechInsights, 35 slides
A Systematic Study on Atomic Layer Deposition of ZrO<sub>2</sub> Thin Films Presentation: Xiangbo Meng, University of Arkansas, 1 slide