Process Control and Mass Delivery Optimization from Low Vapor Pressure Precursors Presentation: Jeffrey Spiegelman, RASIRC, 1 slide
Scaling Low-temperature Thermal ALD of SiO2 to Batch Presentation: Juhana Kostamo, Picosun Oy, Finland, 1 slide
Laterally-Structured Dielectrics by Area-Selective Atomic-Layer-Deposition on 3D Substrates Presentation: Philip Klement, Justus Liebig University Giessen, Germany, 1 slide
Light Assisted Area Selective Atomic Layer Deposition on Plasmonic Nanoantennas Presentation: Chengwu Zhang, University of Connecticut, 1 slide
Area-Specific Atomic Layer Deposition (ALD) of Cobalt As Mediated by Thermally Induced Dehydrocoupled Self-Assembled Monolayers (SAMs) Presentation: Barry Arkles, Gelest, Inc., 1 slide
Investigation of In-situ Surface Cleaning of Cu Films using O3/O2 and N2H4 Presentation: Su Min Hwang, University of Texas at Dallas, 1 slide
Area-Selective Deposition of SiO2 based on Spatial ALD with Interleaved Etching Steps to Obtain High Selectivity Presentation: Alfredo Mameli, TNO/Holst Center, Netherlands, 1 slide
Defect Mitigation Solution for Area-Selective Atomic Layer Deposition of Ru on TiN/SiO2 Nanopatterns Presentation: Annelies Delabie, IMEC, Belgium, 1 slide
Fluidized Bed Molecular Layer Deposition of Ultrathin Poly(ethylene terephthalate) Films on TiO2 P25 Nanoparticles Presentation: Damiano La Zara, Delft University of Technology, Netherlands, 1 slide
High Performance Encapsulation Polymer-Al2O3 Hybrid Thin Layer by Atomic Layer Infiltration Presentation: Hong Rho Yoon, Hanyang University, Republic of Korea, 1 slide
ALD of Metal Oxides Fabricated by using La(NO3)3∙6H2O Oxidant and their Applications Presentation: In-Sung Park, Hanyang University, Republic of Korea, 1 slide
Bringing Higher Etch-resistance to Metal-infiltrated Polymer Presentation: Norikatsu Sasao, Toshiba Memory Corporation, 12 slides
Low-temperature Atomic Layer Deposition of Aluminum Oxide on Polymeric Powder Feedstocks for Improved Powder Rheology Presentation: John Miller, Lawrence Livermore National Laboratory, 1 slide
Atomic Layer Deposition of Molybdenum Oxide Carbide and Molybdenum Carbide Films Presentation: Michael D. Overbeek, Wayne State University, 1 slide
Solid Phase Epitaxy of ALD-Grown PrAlO3 Films Presentation: Navoda Jayakodiarachchi, Wayne State University, 1 slide
Homogenous Distribution of Dopants in ALD Films: Tin-Doped Zinc Oxide (ZTO) Case Study Presentation: Triratna Muneshwar, University of Alberta, Canada, 1 slide
Uniform, Thermal ALD of Al2O3 and ZnO on Zirconia Particles Presentation: Dhruv Shah, Brigham Young University, 1 slide
Composition Control of Ge-Sb-Te Film by Supercycles of ALD GeSb and ALD Sb Followed by Tellurization Annealing Presentation: Yewon Kim, Sejong University, Republic of Korea, 1 slide
Study on The Crystallinity and The Dielectric Constant of ZrxGe1-xO2 Films using Mixed Zr - Ge Precursor by Atomic Layer Deposition Presentation: Ju Young Jeong, Yonsei University, Korea, 1 slide
Molybdenum Disulfides and Diselenides by Atomic Layer Deposition Presentation: Raul Zazpe, University of Pardubice, Czech Republic, 1 slide
Wafer-scale MoS2 Thin Film Deposition via H2S Plasma Sulfurization of ALD-grown MoO3 at Low Temperature Presentation: Jeong-Hun Choi, Korea Maritime and Ocean University, Republic of Korea, 1 slide
ALD-based Synthesis of Few-layer Transition Metal Disulfides with Wafer-scale Uniformity for Device Integration Presentation: Tao Chen, Fudan University, China, 1 slide
Overcoming Agglomeration and Adhesion in Particle ALD Presentation: Benjamin Greenberg, U.S. Naval Research Laboratory, 1 slide
Density Function Theory for Nucleation of MoF6 with Oxide Surfaces in Atomic Layer Deposition of MoS2 Presentation: Matthew Lawson, Boise State University, 1 slide
Chemically and Mechanically Activated Carbonaceous Materials for Supercapacitor Presentation: Seung-Mo Lee, Korea Institute of Machinery and Materials, South Korea, 1 slide