Lithium Organic Thin Films for Various Battery Components Presentation: Juho Heiska, Aalto University, Finland, 16 min 2 sec
ALD Infiltration of LiCoO2 for High Rate Lithium Ion Batteries Presentation: Ian Povey, Tyndall National Institute, Ireland, 15 min 23 sec
ALD Al2O3 and MoS2 Coated TiO2 Nanotube Layers as Anodes for Lithium Ion Batteries Presentation: Jan Macak, University of Pardubice, Czech Republic, 14 min 17 sec
Characterizing Water Delivery for ALD Processes Presentation: James Maslar, National Institute of Standards and Technology, 17 min 23 sec
A Nickel Chloride Adduct Complex as a Precursor for Low-Resistivity Nickel Nitride Thin Films with Tert-butylhydrazine as a Coreactant Presentation: Mikko Ritala, University of Helsinki, Finland, 13 min 54 sec
Simple, Rationally Designed Aluminum Precursors for the Deposition of Low-impurity AlN Films Presentation: Sydney Buttera, Carleton University, Canada, 13 min 5 sec
Atomic Layer Deposition of Lead(II) Sulfide at Temperatures Below 100 °C Presentation: Georgi Popov, University of Helsinki, Finland, 15 min 49 sec
Development and Characterization of a Novel Atomic Layer Deposition Process for Transparent p-Type Semiconducting Nickel Oxide using Ni(tBu2DAD)2 and Ozone Presentation: Konner Holden, Oregon State University, 14 min 51 sec
Blocking Thermolysis in Diamido Plumbylenes Presentation: Goran Bacic, Carleton University, Canada, 13 min 27 sec
ALD of Sc2O3 with Sc(Cp)3 and a Novel Heteroleptic Precursors Presentation: Perttu Sippola, ASM, Finland, 10 min 12 sec
A Novel Self-limited Atomic Layer Deposition of WS2 based on the Chemisorption and Reduction of bis(t-butylimido)bis(dimethylamino) Complexes Presentation: Nicola Pinna, Humboldt-Universtät zu Berlin, Germany, 15 min 32 sec
Overview of Wet And Dry Selective Processes Driven by Area Activation or Deactivation Down to Below 20nm Critical Dimensions Presentation: Silvia Armini, IMEC, Belgium, 26 min 18 sec
Electron-Enhanced Atomic Layer Deposition (EE-ALD) of Cobalt Metal Films at Room Temperature Presentation: Zach Sobell, University of Colorado - Boulder, 17 min 44 sec
Area Selective Atomic Layer Deposition on Molecular Design Presentation: Akihiro Nishida, ADEKA Corporation, Japan, 17 min 18 sec
From Surface Dependence in Atomic Layer Deposition to Area-Selective Deposition of TiN in Nanoscale Patterns Presentation: Annelies Delabie, IMEC, Belgium, 16 min 43 sec
Elucidating Mechanisms of Selective ALD of Al2O3 by a Comparative Study of Precursors Presentation: Il-Kwon Oh, Stanford University, 15 min 2 sec
Area-Selective Atomic Layer Deposition using Dodecanethiols: Comparison of Monolayer versus Multilayer Presentation: Tzu-Ling Liu, Stanford University, 15 min 52 sec
Mechanism for Breakdown in Selectivity During Area-Selective Atomic Layer Deposition of ZrO2on a SiO2 Surface Functionalized with a Blocking Layer Presentation: Wanxing Xu, Colorado School of Mines, 15 min 18 sec
Area Selective Chemical Vapor Deposition of Co from the Co (CO) Precursor: Use of Ammonia to Afford Dielectric-Dielectric Selectivity Presentation: Zhejun Zhang, University of Illinois at Urbana-Champaign, 12 min 43 sec
Area-Selective ALD of Silicon Oxide using Inhibitors in Four-step Cycles for Metal/Dielectric Selectivity Presentation: Marc Merkx, Eindhoven University of Technology, Netherlands, 13 min 15 sec
Selective Area Growth of Deactivating Polymers Presentation: Rudy Wojtecki, IBM Research - Almaden, 15 min 23 sec
Area-Selective ALD of ZnO Films Patterned by Electrohydrodynamic Jet Printing of Polymers with Sub-Micron Resolution Presentation: Tae Cho, University of Michigan, 15 min 36 sec
Area-Selective Deposition and Smoothing of Ru by Combining Atomic Layer Deposition and Selective Etching Presentation: Martijn Vos, Eindhoven University of Technology, Netherlands, 17 min 38 sec
Single Batch Strategies for the Development of an Area Selective Deposition Process with the Deposition/Etch Approach Presentation: Christophe Vallée, LTM-UGA, France, 19 min 48 sec