Growth and Characterization of Sodium Fluoride Thin Films Deposited by Atomic Layer Deposition Presentation: Mrs. Sara Kuraitis, 14 min 39 sec
Effect of Oxidant on Film Properties of HfO2 grown via Atomic Layer Deposition using Newly Synthesized Cp-based Hf Precursors Presentation: Ms. Seonyeong Park, 11 min 35 sec
Interpretation of SiO2 Atomic Layer Etching Based on Plasma Diagnostics Presentation: Mr. Youngseok Lee, 11 min 16 sec
Atomic Layer Etching of Titanium Nitride With O2 Plasma and CF3I Plasma Presentation: Mr. Seon Yong Kim, 9 min 55 sec
On the Reactivity of SiN Surfaces Damaged by Ion Bombardment Towards CH3F and CF4 Precursors Presentation: Mr. Erik Cheng, 15 min 34 sec
Mechanism of Thermal Dry Etching of Metallic Iron Thin Films Using Chlorine and Acetylacetone (acacH) Presentation: Ms. Mahsa Konh, 1 slide
Thermal Atomic Layer Etching of Cobalt with Cl2 Plasma and Hexafluoroacetylacetone (hfacH) Presentation: Mr. Yongjae Kim, 1 slide
Thermal Cyclic Etching of Non-Volatile Material by Self-Stabilizing Organometallic Complex Formation Presentation: Dr. Yoshihide Yamaguchi, 14 min 21 sec
Anomalous Etch Behavior of NHC-Containing Gold Precursor Presentation: Mx. Eden Goodwin, 12 min 25 sec
Novel Electrochemical Concepts for Enabling Atomic Layer Etching of Metals Presentation: Mr. Theodore Phung, 10 min 43 sec
Simultaneous Selective Deposition and Etching of Ru for Atomic Layer Processing of SiO2 Presentation: Ms. Sumaira Yasmeen, 11 min 39 sec
Efficiency Characterization of Reactor-Scale Gas Exchange by CFD Presentation: Mr. Anton Persson, 14 min 13 sec
Surface Modification and Stabilization of Photoluminescence Perovskite Nanocrystals via Atomic Layer Deposition Presentation: Prof. Dr. Rong Chen, 15 min 49 sec
Realization and Dual Angle In-situ OES Characterization of Saturated 10-100 ms Precursor Pulses in a 300 mm CCP Chamber Employing de Laval Nozzle Ring Injector for Fast ALD Presentation: Mr. Abhishekkumar Thakur, 16 min 8 sec
Improvement of Mechanical Properties of Nanoparticles-Based Thin Films by Using Atomic Layer Deposition Presentation: Ms. Fatma Trabelsi, 12 min 11 sec
Atomic Layer Deposition (ALD) of Ultra-Thin Diffusion Barriers on ZnSe Microparticles for Phase Stability in Chalcogenide Glasses for Mid-Infrared Optics Presentation: Ms. Jaynlynn Sosa, 15 min 18 sec
Three-Dimensional Conformal Coating of Particles Resting on a Surface by Vapor‐Phase Infiltration Presentation: Dr. Chang-Yong Nam, 15 min 4 sec
Low Resistivity Titanium Nitride Thin Film Fabricated by Atomic Layer Deposition on Silicon Presentation: Mr. Cheng-Hsuan Kuo, 5 min 52 sec
Nanoscale Film Thickness Gradients Printed in Open Air by Spatially Varying Chemical Vapor Deposition Presentation: Mr. Jhi Yong Loke, 15 min 58 sec
Interface Modification of Bismuth by Atomic Layer Deposition: Enhanced Thermoelectrical Performance Presentation: Mr. Shiyang He, 1 slide
Development of MeCpPtMe3 Platinum Process by Rotary Type Reactor Atomic Layer Deposition on Powders Presentation: Mr. Min Jong Kil, 1 slide
Morphology-Controlled MoS2 by Low-Temperature Atomic Layer Deposition Presentation: Dr. Chengxu Shen, 1 slide
Area-Selective Atomic Layer Deposition Patterned by Electrohydrodynamic Jet Printing for Additive Nanomanufacturing of Functional Materials and Devices Presentation: Mr. Tae Cho, 12 min 32 sec
Nucleation and Growth in Localized Thermal Atomic Layer Depostion Presentation: Mr. Bart de Braaf, 11 min 12 sec