AVS 67 Presentations On Demand (2021)

662 Presentations 0 Sections

The AVS International Symposium and Exhibition addresses cutting-edge issues associated with materials, processing, and interfaces in both the research and manufacturing communities. The weeklong Symposium fosters a multidisciplinary environment that cuts across traditional boundaries between disciplines, featuring papers from AVS technical divisions, technology groups, and focus topics on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 2,000 scientists and engineers gather from around the world to attend.

Thermal Oxidation of Ru(0001) to RuO2 Studied With Ambient Pressure X-ray Photoelectron Spectroscopy

Presentation: J. Trey Diulus, 18 min 55 sec

Double Curling Probe Method for in-situ Monitoring of Electron Density and Film Thickness for Application

Presentation: Daisuke Ogawa, 21 min 10 sec

The (Mostly) Unwelcome Guest in 2D Chalcogenides: Native oxidation rates and the effects of oxygen during processing MoS2, TiS2, and Zr(Sâ€šSe)2

Presentation: Rafael Jaramillo, 17 min 22 sec

Comparative Study of Low Damage Plasma Etching Processes on the Integrity of AlGaN Layers Integrated in GaN HEMT During Gate Opening

Presentation: Oleh FESIIENKO, 18 min 13 sec

Ethanolamines as Bath Additive in Copper Electroless Deposition: Effect on Film Adhesion and Nanowire Formation

Presentation: Jevalyne Vienes, 10 min 40 sec

Formation, Structure and Properties of 2D Silica and Transition Metal Silicates on Gold

Presentation: Eric Altman, 18 min 16 sec

Sub-Surface Imaging of Atomically-Thin Semiconductors Beneath Dielectrics Based on Optical Standing Wave Using Photoelectron Emission Microscopy With Deep-Ultraviolet Photoexcitation

Presentation: Taisuke Ohta, 19 min 58 sec

Power and Temperature Dependence of High Q Superconducting Resonators

Presentation: Ashish Alexander, 19 min 52 sec

In Situ Investigation of the Oxidation of Cu(111) and Reduction of Cu2O Doped with Single Pt Atoms

Presentation: Iradwikanari Waluyo, 21 min 23 sec

Advances in Fatigue Testing of Protective Coatings: A Case Study on Cr-Based Ceramics

Presentation: Helmut Riedl, 19 min 45 sec

Corrosion Induced Diffusion Pathways in Thin Film Materials Investigated by Atom Probe Tomography

Presentation: Oliver E. Hudak, 15 min 14 sec

Surface Characterisation of sp2 Carbon Materials â€“ From Graphene to Nuclear Graphite

Presentation: Sarah Coultas, 19 min 16 sec

Electrodeposition of Mn+3 Rich Layered Î´-Phase Mno2 Nanofibers on Epitaxial Graphene-Silicon Carbide Heterostructures for Fast Selective Gas Sensing

Presentation: Michael Pedowitz, 18 min 9 sec

Development of Low Thermal Budget Si Epitaxy and High-K/Metal Gate Stack for Atomically Precise Electronic Devices

Presentation: Evan M. Anderson, 17 min 46 sec

Temperature Dependent Changes in Surface Chemistry of SrTiO3 Analysed With XPS, Cluster Depth Profiling and Ion Scattering Spectroscopy

Presentation: Paul Mack, 12 min 57 sec

Coincident XPS and Raman Analysis of Drug Composition Phases in a Pain-Killing Tablet

Presentation: Paul Mack, 5 min 16 sec

Characterization on ALD-functionalized Magnesium Borohydride Materials for Hydrogen Storage

Presentation: Margaret A. Fitzgerald, 21 min 42 sec

Study of the Effects of Co-Adsorbed Water on Acetic Acid Decomposition on Metal Surfaces

Presentation: Hoan K.K. Nguyen, 19 min 20 sec

A Multifunctional Plasmonic Nanoplatform of Hyaluronan-Decorated Nanoparticles Fabricated by Atmospheric Plasma for Angiogenic and Antibacterial Applications

Presentation: Cristina Satriano, 27 min 23 sec

Observation of the Two-Photon Transition and Bloch-Siegert Shift of the Electrically Detected Magnetic Resonance Spectrum of Interface Defects in 4H-SiC Metal-Oxide-Semiconductor Field-Effect Transistors

Presentation: James P. Ashton, 20 min 21 sec

Orthogonal Bottom-up Nanopatterning of TiO2 on SiO2 and W on Si-H Using Thermal Atomic Layer Deposition and Etching

Presentation: Jungsik (Justin) Kim, 13 min 56 sec