AVS e-Talk: Surface Microscopy and Microanalysis in an Industrial Research Laboratory
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The top few nanometers of a sample is defined as the surface. The surface is where most chemical reactions take place. There are many instances where the surface of materials are designed/functionalized in order to optimize properties and improve device performance; there are other instances where the surface becomes compromised and the material/device performance degrades. Auger Electron Spectroscopy (AES), X-ray Photoelectron Spectroscopy (XPS), and Time of Flight Secondary Ion Mass Spectrometry (ToF-SIMS) are the three most common, and commercially available, surface analysis techniques. These techniques provide complimentary information regarding the composition/microstructure of the surface and sub-surface region of a sample. In this presentation, I will introduce AES, XPS, and ToF-SIMS, show typical data, and discuss how the data helped understand mechanisms and/or resolve material problems. I will also introduce techniques which we do not have in-house,but have access to via external collaborations.