Aluminum Nitride Grown by Atomic Layer Epitaxy Characterized with Real-time Grazing Incidence Small Angle X-ray Scattering Presentation: V.R Anderson, 14 min 50 sec
Precursor Selection for Low Temperature Plasma Enhanced Atomic Layer Deposition of Silicon Nitride Presentation: S. Weeks, 11 min 10 sec
Selective-Area Atomic Layer Deposition of Metals and Metal Oxides by Modified Nucleation and “Inverse” Polymer Patterning Presentation: G. Parsons , 30 min 48 sec
Comparison of Trimethylgallium and Triethylgallium as "Ga" Source Materials for the Growth of Ultra-thin GaN Films Via Hollow-cathode Plasma-assisted ALD Presentation: M. Alevli, 14 min 30 sec
Atomic Layer Deposition of Ultrathin Metal Oxide Films on Mono-layered Graphene in a Wafer Scale Presentation: S-J. Jeong, 15 min 26 sec
Real-time Studies of Atomic Layer Deposition Using Ambient Pressure X-ray Photoelectron Spectroscopy Presentation: J. Schnadt, 15 min 27 sec
In Situ X-ray Absorption Spectroscopy of ALD Half-cycles on Flat Substrates Presentation: M.S. Weimer , 13 min 58 sec
SiO2 ALD Layers Activation Evidenced Through III-V on Si Hybrid Bonded Interfaces Presentation: A. Talneau, 12 min 42 sec
Towards Atomic Layer Deposition of Carbon-Containing Silicon-Based Dielectrics Presentation: R.A. Ovanesyan, 13 min 7 sec
Plasma-surface Interaction in Plasma ALD: On the Effect of Redeposition Presentation: H.C.M. Knoops, 16 min 7 sec
The Effect of ALD-grown Al2O3 Coatings on the Refractive Index Sensitivity of an Optical Fiber Sensor During Metal Deposition Presentation: D. J. Mandia, 15 min 36 sec
Thin ALD Fluoride Films to Protect and Enhance Al Mirrors in the Far UV Presentation: J. Hennessy, 17 min 14 sec
Atomic Layer Deposition of BiFeO3 Thin Films: Analysis of Secondary Phase Evolution from in Situ Studies Presentation: J.E. Spanier, 12 min 18 sec
The Evolution of the Coordination Environment of ALD ZnO Thin Films from Isolated Atoms to a Wurzite Structure Presentation: A. Yanguas-Gil, 11 min 37 sec
What's Limiting Low-temperature ALD of Al2O3? A Vibrational Broadband Sum-frequency Generation Study Presentation: V. Vandalon, 12 min 48 sec
Photo-assisted ALD of Oxides Employing Alkoxides as Single-source Precursors Presentation: V. Miikkulainen, 13 min 3 sec
Interaction of N2 Plasma with SiNX Surfaces: First-Principles Molecular Dynamics Simulations Presentation: C.K. Ande , 14 min 47 sec
Low-temperature Atomic Layer Deposition of MoS2 Using a Novel Organometallic Precursor Presentation: S. Cadot, 13 min 23 sec
Influence of Nitrogen Plasma Dose on the PEALD of Silicon Nitride Using a Trisilylamine Derivative Precursor Presentation: S.J. Jang, 14 min 20 sec
Towards Atomic Layer Deposition of Gold Metal from Volatile, Ambient-stable, Gold Phosphine Compounds Presentation: M.B.E. Griffiths, 10 min 43 sec
Halides, Alkyls, Amides, Cyclopentadienyls, and What Follows Next? In Pursuit of New and Improved ALD Precursors Presentation: A. Devi, 32 min 2 sec
The Impact of ALD TaN Barrier Processes on Different BEOL Ultra Low-k Dielectrics Presentation: X. Zhang, 13 min 47 sec