AVS 59th International Symposium & Exhibition (2012)

64 Presentations 0 Sections

The AVS International Symposium and Exhibition addresses cutting-edge issues associated with materials, processing, and interfaces in both the research and manufacturing communities. The weeklong Symposium fosters a multidisciplinary environment that cuts across traditional boundaries between disciplines, featuring papers from AVS technical divisions, technology groups, and focus topics on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 2,000 scientists and engineers gather from around the world to attend.

This portal contains a collection of focus topic audio recordings (with the synchronized PowerPoint presentations) from the AVS 59 International Symposium & Exhibition.

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Chemically-resolved Interface Structure of Epitaxial Graphene on SiC(0001)

Presentation: Jonathan Emery, 16 min 3 sec

Structural Analysis of Chemically Functionalized Epitaxial Graphene with High-Resolution X-ray Reflectivity

Presentation: Michael Bedzyk, 16 min 29 sec

Increasing Interface Bonding and Tuning Doping Behavior at Metal-Graphene-Metal Sandwich Contact

Presentation: Cheng Gong, 18 min 11 sec

Bi-layer Graphene Growth on Ni(111): The Role of Monolayer Graphene Rotation

Presentation: Arjun Dahal, 19 min 51 sec

Crystalline and Electrical Properties of Vertically-Laminated Carbon Nanowalls formed by Two-Step Growth Method

Presentation: Hiroki Kondo, 18 min 53 sec

Surface Modification of Vertically Oriented Graphene Electrochemical Double-Layer Capacitors

Presentation: Ronald Quinlan, 18 min 20 sec

X-ray Photoelectron Spectroscopy Investigation of the Valence and Conduction Band Offset at Hexagonal a-BN:H/Si Interfaces

Presentation: Sean King, 22 min 0 sec

Graphene and Dielectric Integration: A Sticky Situation?

Presentation: Virginia Wheeler, 37 min 41 sec

Achieving Scaled Dielectrics on Graphene Using Atomic Layer Deposition

Presentation: Srikar Jandhyala, 18 min 51 sec

Using Raman Spectroscopy and X-ray Photoelectron Spectroscopy to Guide the Development of Graphene-Based Materials

Presentation: Tim Nunney, 22 slides

Dry Transfer of Graphene to Organic and Inorganic Substrates

Presentation: Evgeniya Lock, 1 slide

In Situ Soft X-ray Photon-in/Photon-out Spectroscopy of Photo-electrochemical Reactions of Hematite in Water Splitting

Presentation: Jinghua Guo, 16 min 29 sec

Probing Nitrogen and Metal Speciation in Non-Platinum Electrocatalysts by Ambient Pressure X-ray Photoelectron Spectroscopies and DFT Calculations

Presentation: Kateryna Artyushkova, 22 min 45 sec

Resolving Growth of Palladium Nanocatalysts Using In Situ FT-IR, XAS and PDF under Practical Atomic Layer Deposition Conditions

Presentation: Yu Lei, 18 min 50 sec

In Situ Study of the Oxidation of CO over Ir(111)

Presentation: Joachim Schnadt, 16 min 50 sec

In Situ Real Time Examination of the Thin Film Growth of Pentacene on Polymeric Dielectrics Using X-Ray Synchrotron Radiation: Unexpected Changes in the Evolution of Surface Morphology with Substrate

Presentation: James Engstrom, 19 min 34 sec

In Situ, Real-Time Diagnostics of Colon Cancer and Inflammatory Bowel Diseases by Direct Combination of Endoscopy and Rapid Evaporative Ionization Mass Spectrometry

Presentation: Zoltan Takats, 49 min 47 sec

Nanocrystal Phase Transformations in ZBLAN Glass Ceramics

Presentation: Jacqueline Johnson, 15 min 59 sec

Understanding the Dynamic Electronic Properties of Electrode Materials by In Situ X-ray Absorption Spectroscopy

Presentation: Michael Bagge-Hansen, 15 min 45 sec

In Situ Studies of Al2O3 ALD Growth and Self-cleaning on III-V Surfaces by STM and XPS

Presentation: Leonard Rodriguez, 14 min 17 sec

Atomic Layer Deposition Monitored and Characterized by Joint In Situ Real-Time Spectroscopic Ellipsometry and Direct Surface Analysis

Presentation: Marcel Junige, 20 min 6 sec

An Integrated Approach Toward Understanding the Environmental Fate, Transport, Toxicity and Occupational Health Hazards of Nanomaterials

Presentation: Vicki Grassian, 39 min 15 sec

From R&D Towards Industrial Atomic Layer Deposition: Challenges in Scaling up

Presentation: Matti Putkonen, 39 min 15 sec

Migration to ALD Techniques in the Semiconductor Industry: Pattern Effects, Microloading and Film Thickness Variability in Dielectric Thin Films Deposition

Presentation: Michael Belyansky, 21 min 44 sec

Interface Analysis of PEALD TaCN Deposited on HfO2 using Parallel Angle Resolved X-ray Photoelectron Spectroscopy for sub-20nm Gate Last CMOS Transistors

Presentation: Fabien Piallat, 17 min 0 sec