ALE 2015 Workshop Presentations
29 Presentations
0 Sections
The Need for ALE
Atomic Layer Etching: What Can We Learn from Atomic Layer Deposition?
Prospects for Atomic Layer Etching Using Sequential, Self-limiting Thermal Reactions
Cyclic Etch/Passivation as an All-spatial Concept Toward High-rate room Temperature Atomic Layer Etching
Modeling and Simulation for Rapid Advanced Cyclic Etch Processes
Molecular Dynamics Simulations of Low Damage Atomic Layer Etching
Atomic Level Etching of Poly-Si in a Micro-wave Electron Cyclotron Resonance Plasma Etcher
A Neutral Beam Etching for Control of Atomic Layer Defect Generation and Chemical Reaction
Fluorocarbon Assisted Atomic Layer Etching of SiO2 and Si Using Cyclic Ar/C4F8 Plasma
Fluorocarbon-based Atomic Layer Etching of Silicon Dioxide for Self-aligned Contact
Self-limited Light Implantation for Precise Low-k Spacer Etching
Self-limited Cyclic Etching of Silicon Nitride Using Formation and Sublimation of Ammonium Hexafluorosilicate
Electron Beam Generated Plasmas: Ultra low Te Sources for Atomic Layer Etching
Low Damage Etch Chamber for Atomic Precision Etching
Atomic Layer Etching of 2-D Materials
Selectivity Control in Low-Damage AlGaN/GaN Atomic Layer Etching
Atomic Layer Etching for Metal Etch Applications
Numerical Simulation of Atomic Layer Etching
Selective Removal of Native SiO2 Using XeF2
Novel Hydrogen Peroxide Delivery Systems for Atomic Layer Cleaning and Etch
Application of Cyclic Fluorocarbon/Argon Discharges to Device Patterning
Atomic Level Etching Technology on Microwave ECR Plasma
Precise Control of Process Variables in Atomic Layer Etching
