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AVS 62 Presentations on Demand (2015)

61 Presentations 0 Sections

The AVS International Symposium and Exhibition addresses cutting-edge issues associated with materials, processing, and interfaces in both the research and manufacturing communities. The weeklong Symposium fosters a multidisciplinary environment that cuts across traditional boundaries between disciplines, featuring papers from AVS technical divisions, technology groups, and focus topics on emerging technologies. The equipment exhibition is one of the largest in the world and provides an excellent opportunity to view the latest products and services offered by over 200 participating companies. More than 2,000 scientists and engineers gather from around the world to attend.

This portal contains a collection of focus topic audio recordings (with the synchronized PowerPoint presentations) from the AVS 62 International Symposium & Exhibition.

  • AVS Members may access all content in this portal complimentary as part of your membership benefits package. To access the content, please sign in here using your AVS membership e-mail and password. You may also login via MyAVS at www.avs.org.
  • Nonmembers who are interested in access to this content are encouraged to consider AVS Membership. To review AVS benefits and to join click here.

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"Can Opto-Electronics Provide the Motive Power for Future Vehicles?"

Presentation: Eli Yablonovitch, 32 min 17 sec
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Structured Light and Structured Surface Waves from Metasurfaces

Presentation: Federico Capasso, 34 min 33 sec
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Quest for Extreme Photonics

Presentation: Nader Engheta, 35 min 32 sec
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2D Materials: Graphene and Beyond

Presentation: Tony Heinz, 37 min 59 sec
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Frontiers of Ocean Sensing

Presentation: Susan K. Avery, 31 min 46 sec
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Water Dissociation in Metal Organic Frameworks with Coordinatively Unsaturated Metal Ions: MOF-74

Presentation: Kui Tan, 18 min 4 sec
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Fundamental Examinations of Surface Chemistry-Driven Approaches to Selective Area Atomic Layer Deposition

Presentation: James Engstrom, 21 min 29 sec
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Selective Deposition of Copper-Manganese Alloy for Interconnects

Presentation: Roy Gordon, 35 min 9 sec
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Selective Growth of First Row Transition Metal Films by Atomic Layer Deposition

Presentation: Charles Winter, 40 min 37 sec
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Determination of the Minimum Saturating Dose during Atomic Layer Deposition of Alumina and Titania on Si(100) and Si(100)-H

Presentation: Joshua Ballard, 15 min 39 sec
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More than Moore: Novel Approaches for Increasing Integrated Functionality

Presentation: W. R. Bottoms, 60 slides
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