Revisiting Process Optimization in Atomic Layer Deposition: Going Beyond Growth Rate Presentation: Ms. Elham Rafie Borujeny, 1 slide
Ir Studies on Low-Temperature Atomic Layer Deposition of Aluminum Nitride Using Plasma Excited Ammonia Presentation: Mr. Kentaro Saito, 1 slide
ALD of TiO2 using a Titanium Precursor with a Linked Amido-cyclopentadienyl Ligand: A Density Functional Theory Study Presentation: Mr. Romel Hidayat, 1 slide
Atomic Layer Deposition of Silicon Oxide Using a Silylamine Precursor and Ozone Presentation: Ms. Heeju Son, 1 slide
Hollow Cathode Plasma Enhanced Atomic Layer Deposition of Vanadium Oxide Films: in situ Ellipsometric Monitoring of Film Growth with TEMAV and Oxygen Plasma Presentation: Mr. Adnan Mohammad, 1 slide
Atomic Layer Deposition of Nanometer Thick Tungsten Nitride Using Anhydrous Hydrazine for Potential X-Ray Optics Application Presentation: Mrs. Dan N. Le, 1 slide
Thermal Atomic Layer Deposition of Elemental Antimony at Room Temperature: Growth and Uniformity Studies Presentation: Ms. Majeda Al Hareri, 1 slide
Impact of Different Intermediate Layers on the Morphology and Crystallinity of TiO2 Grown on Carbon Nanotubes by Atomic Layer Deposition Presentation: Dr. Jiao Wang, 1 slide
Comparison of ALD Saturation Profiles Simulated With Two Theoretical Models Presentation: Ms. Jihong Yim, 11 min 56 sec
Oxygen Reservoirs in Metal Oxides: Mechanisms of Reactive Species Formation and Transport in Atomic Layer Deposition of Fe2O3 and NiO Presentation: Mr. Joel Schneider, 14 min 48 sec
Titanium Nitride ALD Process Using High Purity Hydrazine: N2H4 Reactivity in Gas Phase Presentation: Mr. Hayato Murata, 15 min 30 sec
Nonaqueous Atomic Layer Deposition of Zinc Oxide Using Diethylzinc and Ethanol Presentation: Ms. Miso Kim, 15 min 5 sec
Mechanistic Insights into the Thermal ALD of Gold: Infrared, Mass Balance, Nucleation, and Epitaxy Presentation: Dr. Alex Martinson, 14 min 49 sec
Novel ALD Study of TiO2 and ZrO2 on Pmma Substrates as Separate and Mixed Oxide Thin Films for Enhanced Biomaterial Functionalization Presentation: Mrs. Mina Shahmohammadi, 13 min 56 sec
Thin Films Island Structure Analysis Using X-Ray Photoelectron Spectroscopy Methodology Presentation: Mr. Daniil Selyakov, 2 min 51 sec
Atomic Layer Deposition of Bimetallic Alloy and Work Function Modulation Using Discrete Feeding Method Presentation: Mr. Ji Won Han, 14 min 40 sec
Thermal and Plasma Enhanced Atomic Layer Deposition of Tio2 from Amide and Alkoxide Precursors: Growth Characteristics and Photoelectrochemical Performance Presentation: Mr. Shane O'Donnell, 15 min 56 sec
Advanced Atomic Layer Deposition of Metal Oxide Films With Discrete Feeding Method Presentation: Mr. Jae Chan Park, 15 min 2 sec
Study of SiO2 Growth Mechanism Between a Single SiO2 and (HfO2)/(SiO2) Nanolaminate Formation by ALD Using TDMAS and H2O Gas Presentation: Dr. Toshihide Nabatame, 14 min 29 sec
Enhanced Throughput of High-Aspect-Ratio Atomic Layer Deposition Using Trimethylaluminum and Hydrogen Peroxide Presentation: Dr. Hideharu Shimizu, 14 min 41 sec
Toolbox for ALD Process Development on High Surface Area Powders Presentation: Mr. Kristian Knemeyer, 15 min 40 sec
Conformal Atomic Layer Deposition of Ultra-Thin Conductive Silver Films Presentation: Dr. Renaud Leturcq, 15 min 10 sec
Tunable ALD Infiltration into Ultra-High-Aspect-Ratio Aerogels Enabled by Process Modeling for High-Temperature Solar Thermal Applications Presentation: Mr. Andrew J. Gayle, 15 min 0 sec
Plasma-Enhanced Atomic Layer Deposition: Correlating O2 Plasma Parameters and Species to Blister Formation and Conformal Film Growth Presentation: Mr. Andreas Werbrouck, 17 min 17 sec