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ALD-ALE 2018 Presentations

365 Presentations 0 Sections

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A Remote Plasma Spectroscopy Based Method for Monitoring of Atomic Layer Deposition Processes

Presentation: Joseph Brindley, Gencoa Ltd, UK, 20 min 22 sec
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Selective Area Deposition of BN using Electron Enhanced ALD

Presentation: Jaclyn Sprenger, University of Colorado - Boulder, 16 min 13 sec
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Reactive Monolayers for use in Area Selective Atomic Layer Deposition

Presentation: Rudy Wojtecki, IBM Research - Almaden, 14 min 8 sec
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Area-selective Atomic Layer Deposition using Si Precursor Inhibitors

Presentation: Mohammad Rizwan Khan, Incheon National University, Korea, 15 min 54 sec
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In Situ and Ex Situ Monitoring and Metrology for the Development of a Selective Deposition Process

Presentation: Christophe Vallee, LTM-UGA, France, 12 min 42 sec
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Area-Selective Atomic Layer Deposition of TiN, TiO2, and HfO2 on Si3N4 in Sub-50 Nanometer Si3/N4/Amorphous Carbon Structures

Presentation: Eric Stevens, IMEC, 17 min 43 sec
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Toward Area Selective ALD on Metal/Dielectric Patterns: Comparison of Cu, Co, W and Ru

Presentation: Dara Bobb-Semple, Stanford University, 16 min 0 sec
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Advanced Cycles for Area-selective Atomic Layer Deposition

Presentation: A.A. Amusan, 29 min 1 sec
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The Precise Tailoring of Catalyst Interface by Atomic Layer Deposition

Presentation: Yong Qin, Institute of Coal Chemistry, Chinese Academy of Sciences, China, 36 min 9 sec
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Improving the Anti-sintering Ability of Au/TiO2 Catalysts by Constructing Semi-embedded Structure via Selective Atomic Layer Deposition

Presentation: Yuanting Tang, Huazhong University of Science and Technology, China, 16 min 56 sec
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Tuning of Boron Nitride Nanotubes, Nanopores and Nanoporous Membranes by ALD

Presentation: Matthieu Weber, Institut Européen des Membranes, France, 13 min 9 sec
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Integrated Isothermal Atomic Layer Deposition and Thermal Atomic Layer Etching: “Atomic-Level Processing” for Area-Selective Patterning of TiO2

Presentation: Seung Keun Song, North Carolina State University, 15 min 21 sec
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Inherent Substrate Selectivity and Nucleation Enhancement during Ru ALD using the RuO4/-Precursor and H2-gas

Presentation: Matthias Minjauw, Ghent University, Belgium, 16 min 2 sec
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Surface Preparation and High Nucleation for Selective Deposition using Anhydrous Hydrogen Peroxide

Presentation: Dan Alvarez, Jr. PHD, 14 min 31 sec
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An Inherently Selective Atomic Layer Deposition of MoSix ­on Si (001) in Preference to Silicon Nitride and Silicon Oxide

Presentation: Jong Youn Choi, University of California San Diego, 12 min 42 sec
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Investigating the Difference in Nucleation during Si-based ALD on Different Surfaces (Si, SiC, SiO2 and SiNx) for Future Area-Selective Deposition (AS-ALD)

Presentation: Ekaterina A. Filatova, Tyndall National Institute, University College Cork, Ireland, 16 min 5 sec
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Strategies for Area Selective Atomic Layer Deposition and Applications in Catalysis

Presentation: Rong Chen, Huazhong University of Science and Technology, China, 35 min 35 sec
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Amorphous In-Ga-Zn-O Thin-Film Transistor-Based Nonvolatile Memory Devices

Presentation: Shi-Jin Ding, Fudan University, China, 32 min 7 sec
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Atomic Layer Deposition of Elemental Tellurium for Composition Tuning Of Ovonic Threshold Switching Materials

Presentation: Stephen Weeks, Intermolecular, Inc., 19 min 24 sec
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Plasma Enhanced Atomic Layer Deposition of Low Temperature Silicon Nitride for Encapsulation Layer using Novel Silicon Precursor

Presentation: SungGi Kim, DNF Co. Ltd, 15 min 38 sec
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Atomic Layer Delta Doping and Deposition of Ultrathin Metallic TiN-based Channel for Room-temperature Field Effect Transistor

Presentation: Yu-Tung Yin, National Taiwan University, Republic of China, 12 min 36 sec
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Influences of Annealing Conditions on Characteristics of Sn-doped Zinc Oxide Thin Film Transistors Fabricated by Atomic Layer Deposition

Presentation: Tao Wang, Fudan University, China, 11 min 52 sec
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Atomic Layer Deposition of Yttrium Oxide from Bis(Methylcyclopentadienyl) (MethylPentyl Pyrazolato) Yttrium (III)

Presentation: Jun Feng, EMD Performance Materials, 14 min 25 sec
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Low-temperature Thermal ALD of SiO2 Increasing the Possibilities

Presentation: Juhana Kostamo, Picosun Oy, Finland, 13 min 38 sec
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Non-pyrophoric Aluminum Precursor for Thermal Atomic Layer Deposition of Al2O3 Thin Films

Presentation: Jungwun Hwang, Hansol Chemical, Republic of Korea, 15 min 29 sec
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