ALD-ALE 2018 Presentations
365 Presentations
0 Sections
ALD/ALE 2018 Schedule
ALD/ALE 2018 Technical Program/Abstract Book
Investigation of Atomic Layer Etching Process and UV Damage for AlGaN/GaN HEMT
Plasma-assisted Atomic Layer Etching of Si-based Dielectric Films Studied using in situ Surface Diagnostics
Silicon Atomic Layer Etching by Two-step Plasma-enhanced Atomic Layer Deposition Consisting of Oxidation and (NH4)2SiF6 Formation
Molecular Dynamics Simulation of SiO2 Atomic-layer Etching (ALE) by Fluorocarbon and Argon Plasmas
Bias System for Controlling Ion Energy Distributions
Reactions of Hexafluoroacetylacetone ( hfac) and Metal Surfaces under Low-energy Ion Irradiation
Application of ALE Technology to <10nm Generation Logic Device Fabrication
Isotropic Atomic Layer Etching of ZnO on 3D Nanostructures, using Acetylacetone and O2 Plasma
Etching Reactions of Halogenated Layers Induced by Irradiation of Low-energy Ions and Gas-clusters
Optimization of Atomic Layer Etch Process for Fabrication of Dual Barrier GaN-based Power Device using in-situ Auger Spectrometric Surface Analysis
ALE to Enable Memory Scaling
Forcing Timescale: Can Monolayer Stability Be Built Into a Precursor?
Comparative Study on New Heteroleptic Zirconium ALD Precursors
A New Class of ALD Precursors for Aluminum Oxide – Potential Alternative to TMA!
Atomic Layer Deposition of Aluminum Metal Using a Thermally Stable Aluminum Hydride Reducing Agent
Low Temperature PE-ALD of Copper Films using Copper Aminoalkoxides Precursors with Hydrogen
Atomic Layer Deposition of Rhenium Selenide Thin Films
Plasma Enhanced Atomic Layer Deposition of Silicon Nitride Films with Inorganic Disilane Precursors
Different Growth Mechanism of SiO2 Layer on Various High-k films by PE-ALD using Tris(dimethylamino)silane and Oxygen Plasma
In-situ Surface Science Studies of Atomic Layer Processes of GaN Surfaces in Preparation for Atomic Layer Epitaxial Growth
Surface Chemistry during Atomic Layer Deposition of Zn(O,S)
