ALD-ALE 2018 Presentations
365 Presentations
0 Sections
Controlling Material Properties of Nanostructured WS2 during Plasma ALD for Improved Electrochemical Performance
Using ALD to Engineer Metal/Insulator/Metal Devices
Impact of Metal Nanocrystal Size and Distribution on Resistive Switching Parameters of Oxide-based Resistive Random Access Memories by Atomic Layer Deposition
Epitaxial Electronic Materials by Atomic Layer Deposition
Scaling Ferroelectric Hf0.5Zr0.5O2 for Back-end of Line Integration
Atomic Layer Deposition for Logic Device Manufacturing
Effect of ZrO2 Capping-layer on Ferroelectricity of HfxZr1−xO2 Thin Films by ALD using Hf/Zr Cocktail Precursor
Efficient Photoelectrochemical H2 Generation using Molybdenum Disulfide Film on Black Si Photocathode Via Wafer-scale Atomic Layer Deposition
Junction Interface Passivation by ALD in CIGS Solar Cells
Spatial Atomic Layer Deposition: Up-scalable Route of Metal Oxide Functional Layers for High Efficient and Stable Perovskite Solar Cells and Modules
Applications of Atomic Layer Deposition in Solar Energy Conversion
Inorganic Charge Transport Layers Grown via Atomic Layer Deposition for Highly Stable and Efficient Perovskite Solar Cell
Simultaneous Enhancement of Toughness and Elimination of the UV Sensitivity of Kevlar with a Combined ALD/MPI Process
Mutual Synergistic Doping in Conductive Hybrid Materials Obtained after Vapor Phase Infiltration
Infiltration Synthesis of ZnO in a Non-reactive Polymer Facilitated by Residual Solvent Molecules
Thermal Conductivity in Layer-engineered Inorganic-Organic Thin Films
Reversible Trans-cis Photoisomerization of ALD/MLD-fabricated Azobenzene-based Inorganic-Organic Thin Films
Organic/Inorganic Nanocomposite Synthesis through Sequential Infiltration of 3D Printed Polymer Parts: A Microstructural Study
Reactivity of Common ALD Precursors with OH/H2O-containing Metal Organic Framework Materials
Atomic/Molecular Layer Deposition of Inorganic-Organic Carboxylate Network Thin Films for Possible Sensing Applications
Open Air Processing of Innovative Transparent Conductive Materials with Spatial ALD
Conformality of SiO2 and Al2O3 Coatings Produced using High Speed Spatial ALD with a DC Plasma
Characterizing Precursor Delivery from Vapor Draw Ampoules
