Study on ALD Carbide Chemistry Approach for Rhenium Presentation: Jani Hämäläinen, University of Helsinki, Finland, 18 min 43 sec
Development of Advanced Precursors for Deposition of Cobalt Films Presentation: Sergei Ivanov, Versum Materials, 12 min 29 sec
Diamine Adduct of Cobalt(II) Chloride for ALD of Stoichiometric Cobalt(II) Oxide and Reduction Thereof to Cobalt Metal Thin Films Presentation: Katja Väyrynen, University of Helsinki, Finland, 18 min 17 sec
Development New Metal Precursors for Atomic Layer Deposition at KRICT Presentation: Taek-Mo Chung, Korea Research Institute of Chemical Technology (KRICT), Republic of Korea, 28 min 30 sec
Surface Chemistry during Atomic Layer Deposition of Nickel Sulfide Presentation: Ran Zhao, Peking University, China, 12 min 41 sec
Exchange Reactions during Atomic Layer Deposition: ZnO Conversion to Al2O3 by Trimethylaluminum Presentation: Steven M. George, University of Colorado - Boulder, 17 min 50 sec
Elucidation of the Mechanisms of Nickel (II) and Iron (III) Oxide Films Grown with Ozone by Atomic Layer Deposition Presentation: Joel Schneider, Stanford University, 14 min 3 sec
Reaction Mechanisms of the Atomic Layer Deposition of Indium Oxide Thin Films Using Ethylcyclopentadienyl Indium Presentation: Fumikazu Mizutani, Kojundo Chemical Laboratory Co.,Ltd., Japan, 10 min 5 sec
Reaction Mechanisms of Halogenated Silanes on N-rich Surfaces during Atomic Layer Deposition of Silicon Nitride Presentation: Gregory Hartmann, University of Texas at Austin, 16 min 56 sec
Studying Metal ALD Processes through X-ray Based in situ Characterization Presentation: Christophe Detavernier, Ghent University, Belgium, 31 min 31 sec
Stresses in ALD Films: Aiming for Zero Stress Thin Films Presentation: Tero Pilvi, Picosun Oy, Finland, 13 min 12 sec
High-throughput Screening of Atomic Arrangements of Surface and Interfacial Structures of ALD-deposited Thin Films Presentation: Orlando Trejo, University of Michigan, 14 min 58 sec
Application of Low Energy Ion Scattering for Characterization of Modern ALD Films of Industrial Relevance Presentation: Philipp Brüner, ION-TOF GmbH, Germany, 16 min 0 sec
Characteristic Evaluation of ZrO2 Thin Films by PEALD to Semiconductor and Display using Cp-Zr Precursor Presentation: Sang-Yong Jeon, DNF Co. Ltd, Republic of Korea, 14 min 34 sec
Hybrid Electronically Tailorable Dielectric Thin Films and Substrate Effects on Electrical and Chemical Properties of ALD Al2O3 Presentation: Jessica Kopatz, Pennsylvania State University, 11 min 18 sec
Atomic Layer Deposition of Pyrite FeS2, CoS2, and NiS2 Presentation: Xinwei Wang, Peking University, China, 10 min 21 sec
Modeling the Infiltration Kinetics of Porous, High Surface Area Materials in ALD: Effective Diffusivities, Saturation Times, and Densification Presentation: Angel Yanguas-Gil, Argonne National Laboratory, 16 min 49 sec
Thin Film Conformality Analysis, Reliability and Modeling using All-silicon Lateral High Aspect Ratio Structures Presentation: Oili Ylivaara, VTT Technical Research Centre of Finland, 11 min 27 sec
High Step Coverage Properties of New Zr Precursors with High Thermal Stability for High-k Presentation: Haeng-Don Lim, DNF Co. Ltd, Republic of Korea, 16 min 55 sec
Atomic Layer Deposition: Tailoring High Aspect Ratio TiO2 Nanostructures Presentation: Raul Zazpe, University of Pardubice, Czech Republic, 14 min 6 sec
Mechanisms Limiting Conformality in Thermal and Plasma-assisted ALD Investigated by Lateral High Aspect Ratio Structures Presentation: Karsten Arts, Eindhoven University of Technology, Netherlands, 14 min 19 sec
Multilayers on Reinforcement Fiber Fabrics with ALD Presentation: Pauline Dill, Chemnitz University of Technology, Germany, 16 min 3 sec
Enhanced Thermal Stability of LTO Electrode by Atomic-Layer-Deposited Al2O3 Presentation: Seunghoon Nam, Korea Institute of Machinery and Materials, Republic of Korea, 11 min 45 sec
Electrochemical Performance of Atomic Layer Deposited Zinc Oxysulfide Thin Film in Li-ion Battery Presentation: Soumyadeep Sinha, Chonnam National University, Republic of Korea, 16 min 12 sec
Interfacial and Surface Design of Electrode by ALD and MLD for Next-generation Batteries Presentation: Xueliang (Andy) Sun, University of Western Ontario, Canada, 32 min 36 sec