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ALD/ALE 2020 Virtual Meeting

243 Presentations 0 Sections

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Density Functional Theory Study on the Reducing Agent for Atomic Layer Deposition of Tungsten using Tungsten Chloride Precursor

Presentation: Yewon Kim, Sejong University, 1 slide
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Thermal Atomic Layer Deposition of Aluminum Nitride using a Liquid Aluminum Dihydride Complex and Ammonia

Presentation: Wonyong Koh, UP Chemical Co., Ltd., 1 slide
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Density Functional Theory Study on the Reactions of Fluorine-Containing Molecules on Silicon Nitride Surface

Presentation: Tanzia Chowdhury, Sejong University, 1 slide
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Density Functional Theory Study on the Surface Reaction of the Hafnium Precursor with a Linked Amido-Cyclopentadienyl Ligand

Presentation: Romel Hidayat, Sejong University, 1 slide
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Low Damage Remote Plasma ALD of Dielectric Layers on Graphene

Presentation: Michael Powell, Oxford Instruments Plasma Technology, 1 slide
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Crystallized ZnO Room-Temperature Atomic Layer Deposition and its Application

Presentation: Kazuki Yoshida, Yamagata University, 1 slide
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Effect of Deposition Temperature on the Crystallinity and Polarization of Ga-doped HfO2 Films by Atomic Layer Deposition

Presentation: Ju-Young Jeong, Yonsei University, 1 slide
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Modelling of Low-Temperature Atomic Layer Deposition of Silicon Nitride using Plasma Excited Ammonia

Presentation: Kentaro Saito, Yamagata University, 1 slide
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Design of Li-Containing Layers with LiHMDS

Presentation: Andreas Werbrouck, Ghent University, 1 slide
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ALD-Grown Aluminum Oxide Coatings for Nuclear Applications

Presentation: Boris Paladino, Italian Institute of Technology, 1 slide
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Atomic Layer Deposited Nitrogen Incorporated MoOx Films: Electrical and Electrochemical Properties

Presentation: Arpan Dhara, Ghent University, 1 slide
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Atomic Layer Deposition of Yttrium Oxide Films and their Properties of Water Wettability

Presentation: Bo Zhao, Ghent University, 1 slide
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Comparative Study of ALD Barrier Oxides for Moisture Barrier Applications in LED Manufacturing

Presentation: Sebastian Taeger, OSRAM Opto Semiconductors GmbH, 1 slide
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Improvement of Thin-Film Transistor Performance in Atomic Layer Deposited SnO Film by Thermal Annealing Process

Presentation: Su-Hwan Choi, Hanyang University, 1 slide
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Effect of Ligand Structure on Crystallinity of Atomic Layer Deposited Titanium Dioxide

Presentation: Sanghun Lee, Yonsei University, 1 slide
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Photoactive Hybrid Thin Films by Molecular Layer Deposition

Presentation: Melania Rogowska, University of Oslo, 1 slide
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Quinizarin: A Large Aromatic Molecule Ideal for Atomic Layer Deposition

Presentation: Per-Anders Hansen, University of Oslo, 1 slide
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Hollow-Cathode Plasma-Assisted Atomic Layer Deposition of III-Nitrides: How the Substrate and Plasma Chemistry Impacts the Raman Spectroscopy Analysis of GaN and InN Thin Films

Presentation: Deepa Shukla, University of Connecticut, 1 slide
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Development of Indium Precursors for Deposition of Indium Oxide

Presentation: Takashi Ono, Air Liquide Laboratories, 1 slide
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Inducing Conductivity into Parylene C by Vapor Phase Infiltration of In2O3

Presentation: Oksana Yurkevich, CIC nanoGUNE BRTA, 1 slide
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New Hydrazine Based Precursors For Semiconductor Fabrication

Presentation: Wolf Schorn, Umicore AG & Co. KG, 1 slide
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In situ Thermal Annealing of ALD Fabricated Pt Nanoparticles and Their Stabilization via Al2O3 Overcoating

Presentation: Matthias Minjauw, Ghent University, 1 slide
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Studying the Co-Reactant Role During Plasma-Enhanced Atomic Layer Deposition of Palladium

Presentation: Ji-Yu Feng, Ghent University, 1 slide
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The Use of ALD Layers for Hermetic Encapsulation in the Development of a Flexible Implantable Micro Electrode for Neural Recording and Stimulation

Presentation: David Schaubroeck, IMEC - Ghent University, 1 slide
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The Effect of Electrode Material and Doping Concentration on Physical and Electrical Properties by Using Thermal and Plasma-Assisted Atomic Layer Deposition in Ferroelectric Zr-doped HfO2 Dielectrics

Presentation: Wen-Hao Cho, Taiwan Instrument Research Institute, 1 slide
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