Effect of Deposition Temperature on Titanium Nitride in Plasma-Enhanced Atomic Layer Presentation: Heli Seppänen, Aalto University, 10 min 36 sec
Novel Chemistries for Layer-by-Layer Etching of 2D Semiconductor Coatings and Organic-Inorganic Hybrid Materials Presentation: Anil U. Mane, Argonne National Laboratory, 29 min 18 sec
Atomic Layer Deposited Al-doped TiOx as Passivating Contacts on Silicon Solar Cells Presentation: Borong Sang, University of New South Wales, 16 min 21 sec
The Evolution of Temperature Monitoring in ALD Presentation: Jason Mershon, Advanced Energy Industries, Inc., 17 min 44 sec
Thermally Assisted Area Selective Atomic Layer Deposition Presentation: Bart de Braaf, Eindhoven University of Technology, 1 slide
Low Temperature Thermal a-SiC Deposition Using Pulse CVD and ALD Presentation: Susumu Yamauchi, Tokyo Electron Technology Solutions Limited, 1 slide
Infrared Spectroscopy of SiNx Grown by Atomic Layer Deposition on Structured Substrates Presentation: Yuji Otsuki, Tokyo Electron Technology Solutions Limited, 16 slides
The Structure and Properties of Titanium Nitride Layers Grown by Plasma Enhanced Atomic Layer Deposition on Different Substrates Presentation: Valentina Korchnoy, Technion - Israel Institute of Technology, 18 slides
Enabling Strong Magnetoelectric 2-2 Composites Made of AlN Films Grown by Plasma-Enhanced ALD on Magnetostrictive Foils for Energy Harvesting Applications Presentation: Tai Nguyen, Luxembourg Institute of Science and Technology, 1 slide
Novel Approach for Conformal Chemical Vapor Phase Deposition of Ultra-Thin Conductive Silver Films Presentation: Sabrina Wack, Luxembourg Institute of Science and Technology, 1 slide
Advanced 3D Particle Functionalization using Self-Limiting Reactions in Fluidized Bed Reactor Technology Presentation: Didier Arl, Luxembourg Institute of Science and Technology, 7 slides
Solution-Based ALD Routes Towards Thin Films of Organic-Inorganic Hybrid Perovskites Presentation: Vanessa Koch, Friedrich-Alexander-University Erlangen-Nürnberg, 1 slide
The Influence of ALD-ZnSnO Buffer Layer Process Conditions on the Characteristics of Tin Sulfide Thin Film Solar Cells Presentation: Jae Yu Cho, Chonnam National University, 1 slide
A Novel Cobalt Precursor for Area-Selective Deposition Presentation: Hiroyuki Oike, TOSOH Corporation, 1 slide
Comparison of Growth Characteristics and Nanoparticle Formation by O2 or H2 Reactant Gas in Pt ALD Presentation: Tatsuya Nakazawa, Yonsei University, 1 slide
In-situ Real-Time and Ex-situ Spectroscopic Analysis of Al2O3 Films Prepared by PEALD Presentation: Paul Plate, SENTECH Instruments GmbH, 1 slide
Stabilizing Red Fluoride LED Phosphors using Atomic Layer Deposition Presentation: Geert Rampelberg, Ghent University, 1 slide
Modulated VO2 Phase Change Properties by Ge Doping Presentation: Guandong Bai, University of Cambridge, 1 slide
Topographic Area Selective Deposition: A Comparison Between PEALD/ALE and PEALD/Sputtering Approaches Presentation: Moustapha Jaffal, LTM-UGA, 1 slide
Conformality of TMA/H2O and TMA/O3 Processes Evaluated using Lateral High-Aspect-Ratio Structures Presentation: Sakari Lepikko, Aalto University, 1 slide
Atomic Layer-Deposited Superconducting Niobium Nitride for Quantum Device Applications Presentation: Mario Ziegler, Leibniz Institute for Photonic Technologies Jena, 1 slide
Gold-Coated Optical Fibers are Sensors for ALD Deposition and Can be Exploited for Biosensing Presentation: Eden Goodwin, Carleton University, 1 slide
Carbenes Can Make a CVD Process into an ALD Process by Surface Passivation Presentation: Aya Kadri, Carleton University, 1 slide
Development of ALD Copper Oxide and Al:CuxO Films Presentation: Virginia Wheeler, U.S. Naval Research Laboratory, 1 slide