Homoleptic and Heteroleptic Alkoxide Precursors for Deposition of Aluminum Oxide Thin Films Presentation: Liao Cao, Ghent University, 1 slide
Biocompatibility of ALD Coatings on Nano- and Microstructures: Cell Viability Studies of Murine and Human Induced Stem Cell-Derived Neurons Presentation: Robert Zierold, Universität Hamburg, 1 slide
Growth for Solution ALD for PV Application Presentation: Maïssa K. S. Barr, Friedrich-Alexander University of Erlangen-Nürnberg, 1 slide
A Combinatorial Approach to the Ferroelectric Properties in HfxZr1-xO2 Deposited by Atomic Layer Deposition Presentation: Yong Chan Jung, University of Texas at Dallas, 1 slide
The Role of Steric Hindrance During Plasma Enhanced ALD of SiO2 Presentation: Chenhui Qu, University of Michigan, 23 slides
Plasma Enhanced Atomic Layer Deposition of Carbon Incorporated Silicon Oxynitride (SiON) Thin Films Using Novel Organochlorodisiloxane Precursors Presentation: Dan Le, The University of Texas at Dallas, 1 slide
Area Selective Atomic Layer Deposition of Molybdenum Films on Nanoscale Metal and Metal Nitride Patterns Presentation: Se-Won Lee, Merck Performance Materials Ltd. Korea, 14 slides
ALD-Grown Gallium Oxide Thin Films with Properties Close to Bulk Wafers Presentation: Elham Rafie Borujeny, University of Alberta, 1 slide
Understanding the Influence of In-situ Ar-Plasma Annealing Processes on the Film Properties of ALD-Grown AlN Layers Presentation: Saidjafarzoda Ilhom, University of Connecticut, 1 slide
Efficient and Flexible Dielectrics at Elevated Temperatures from Polymers Sandwiched with Wide Bandgap Inorganic Films Grown via Atomic Layer Deposition Presentation: Necmi Biyikli, University of Connecticut, 1 slide
Thin-Film Deposition from Mo(CO)6: The Effect of Co-Reactants and Temperature on Film Purity Presentation: Phillip Chen, Entegris, Inc., 1 slide
Feasibility of Boron Nitride Film Growth at Lower-than 250°C Substrate Temperature via Hollow-Cathode Plasma-ALD: In-situ Monitoring of Plasma Composition Effect Presentation: Adnan Mohammad, University of Connecticut, 1 slide
Structure, Morphology and Mechanical Behavior of ALD TiSiN films Presentation: Hae Young Kim, Eugenus, Inc., 1 slide
On the Atomic Layer Deposition of Catalysts for Dehydrogenation of Propane with CO2: The Study of Reaction Performance and Coke Formation Presentation: Fatemeh Gashoul Daresibi, University of Tehran, 1 slide
Ti-Doped ZnO Thin Films by Atomic Layer Deposition: Growth Mechanism Study and Influence of Process Parameters on Material Properties Presentation: Damien Coutancier, IPVF-CNRS, 1 slide
Indium Aluminum Nitride Growth Kinetics and Crystallinity Studied Using In Situ and Ex Situ Synchrotron X-ray Scattering Presentation: Jeffrey Woodward, ASEE, 1 slide
Potential of Guanidinate and Amidinate Gallium Complexes as Precursors for Atomic Layer Deposition Presentation: Paul-Alexis Pavard, CNRS-IPVF, 1 slide
300 mm-Wafer Characterization of Ruthenium Area-Selective Deposition in Nanoscale Line-Space and Hole Patterns Presentation: Jan-Willem Clerix, KU Leuven – University of Leuven/IMEC, 1 slide