ALD/ALE 2020 Virtual Meeting
243 Presentations
0 Sections
Thermal Atomic Layer Deposition of Aluminum Nitride using a Liquid Aluminum Dihydride Complex and Ammonia
Density Functional Theory Study on the Reactions of Fluorine-Containing Molecules on Silicon Nitride Surface
Density Functional Theory Study on the Surface Reaction of the Hafnium Precursor with a Linked Amido-Cyclopentadienyl Ligand
Low Damage Remote Plasma ALD of Dielectric Layers on Graphene
Crystallized ZnO Room-Temperature Atomic Layer Deposition and its Application
Effect of Deposition Temperature on the Crystallinity and Polarization of Ga-doped HfO2 Films by Atomic Layer Deposition
Modelling of Low-Temperature Atomic Layer Deposition of Silicon Nitride using Plasma Excited Ammonia
Design of Li-Containing Layers with LiHMDS
ALD-Grown Aluminum Oxide Coatings for Nuclear Applications
Atomic Layer Deposited Nitrogen Incorporated MoOx Films: Electrical and Electrochemical Properties
Atomic Layer Deposition of Yttrium Oxide Films and their Properties of Water Wettability
Comparative Study of ALD Barrier Oxides for Moisture Barrier Applications in LED Manufacturing
Improvement of Thin-Film Transistor Performance in Atomic Layer Deposited SnO Film by Thermal Annealing Process
Effect of Ligand Structure on Crystallinity of Atomic Layer Deposited Titanium Dioxide
Photoactive Hybrid Thin Films by Molecular Layer Deposition
Quinizarin: A Large Aromatic Molecule Ideal for Atomic Layer Deposition
Hollow-Cathode Plasma-Assisted Atomic Layer Deposition of III-Nitrides: How the Substrate and Plasma Chemistry Impacts the Raman Spectroscopy Analysis of GaN and InN Thin Films
Development of Indium Precursors for Deposition of Indium Oxide
Inducing Conductivity into Parylene C by Vapor Phase Infiltration of In2O3
New Hydrazine Based Precursors For Semiconductor Fabrication
In situ Thermal Annealing of ALD Fabricated Pt Nanoparticles and Their Stabilization via Al2O3 Overcoating
Studying the Co-Reactant Role During Plasma-Enhanced Atomic Layer Deposition of Palladium
The Use of ALD Layers for Hermetic Encapsulation in the Development of a Flexible Implantable Micro Electrode for Neural Recording and Stimulation
