Comprehensive Studies of Atomic Layer Deposited InGaO Thin Films using InCA-1, TMGa and H2O2 for Oxide Semiconductor Thin Film Transistor Applications Presentation: Jiazhen Sheng, Hanyang University, Republic of Korea, 16 min 39 sec
In-situ Real-time and in-vacuo Study of the Temperature Impact on the Al2O3 ALD Nucleation upon Pristine Monolayer Graphene Presentation: Marcel Junige, 17 min 40 sec
Investigation of the Influence of Plasma Parameters During Aluminum Nitride Atomic Layer Epitaxy using Grazing Incidence Small Angle X-ray Scattering Presentation: Virginia Anderson, U.S. Naval Research Laboratory, 15 min 38 sec
Studies of Surface Structure and Surface Chemistry During Plasma-Assisted Atomic Layer Epitaxial Growth of InN Semiconductor Thin Films on GaN Substrates Presentation: Samantha Rosenberg, U.S. Naval Research Laboratory, 13 min 9 sec
Plasma Gas Chemistry Influence on Growth of InN Films by Atomic Layer Epitaxy Presentation: Neeraj Nepal, U.S. Naval Research Laboratory, USA, 12 min 17 sec
Spectroscopic Ellipsometry of WO3 Thin Films from ALD: In-situ Layer-by-Layer Growth Monitoring and ex-situ Optical Characterization Presentation: Ufuk Kilic, University of Nebraska Lincoln, 15 min 7 sec
Large Area Spatial Atmospheric ALD Presentation: Corné Frijters, TNO/Holst Center, Netherlands, 17 min 45 sec
Low Resistivity Titanium Nitride ALD: Low Temperature Enabled by the Use of Ultra-High Purity Hydrazine Presentation: Daniel Alvarez, RASIRC, 18 min 40 sec
Modeling Ampoule Performance for Low Vapor Pressure Precursor Delivery Presentation: James Maslar, National Institute of Standards and Technology, 16 min 25 sec
An innovative chamber designed for ALD, PECVD and FAST® SiO2 processes: towards high throughput and conformal deposition at low temperature Presentation: Laetitia Bonnet, KOBUS, France, 16 min 15 sec
Growth Rates During Silicon Spatial Electron-Enhanced Atomic Layer Deposition: Role of Dangling Bond Lifetime Presentation: Andrew Cavanagh, University of Colorado, 18 min 58 sec
Spatial Atomic Layer Deposition of Gate Encapsulation Silicon Nitride for Self-Aligned Contact Enablement Presentation: Jiehui Shu, GLOBALFOUNDRIES U.S. Inc., 12 min 57 sec
Flexible Functional Devices at Mass Production Level with the FLEx R2R sALD Platform Presentation: Diederick Spee, Meyer Burger B.V., Netherlands, 15 min 40 sec
All-Organic Spatial MLD: Troubleshooting Deposition onto Porous Substrates Presentation: Daniel Higgs, ALD NanoSolutions, Inc., 15 min 38 sec
Graphene Oxide Functionalization by Molecular Layer Deposition Presentation: Mercedes Vila Juarez, Coating Technologies S.L., Spain, 15 min 14 sec
Structural and Electronic Properties of MoS2 Grown using a 300mm Commercial Atomic Layer Deposition (ALD) Reactor Presentation: Paul K. Hurley, Tyndall National Institute-University College Cork, Ireland, 1 slide
Atomic Layer Deposition Surface Functionalized Adsorbents for Adsorption of Metal Ions and Organic Pollutants Presentation: Xiaofeng Wang, Missouri University of Science and Technology, 1 slide
Supported Ni Nanoparticle Catalysts Synthesized by Atomic Layer Deposition for Dry Reforming of Methane Presentation: Zeyu Shang, Missouri University of Science and Technology, 1 slide
Wear Behavior of Annealed Atomic Layer Deposited Alumina Thin Films Presentation: Zakaria Hsain, Lehigh University, 1 slide
Surface Enhanced Raman Scattering Effect on Various Pt Nanostructures by using Self-aligned Block Co-Polymer Template, Pt Atomic Layer Deposition Presentation: Won-Kyun Yeom, Sung Kyun Kwan University, Republic of Korea, 1 slide
Effect of Post-annealing on the Performance of Ultraviolet Photodetectors with Atomic-Layer-Deposited ZnO Semiconductor Presentation: Jian Gao, Fudan University, China, 1 slide
Density and Origin of Pinhole-Defects in ALD Barrier Coatings on Steel Substrates Presentation: Tim Poljansek, Robert Bosch GmbH, Germany, 1 slide
Room-Temperature Atomic Layer Deposition of Al2O3 for Anticorrosion Coatings Presentation: Kensaku Kanomata, Yamagata University, Japan, 1 slide
Characterization of the Alumina-Alucone Multilayer Thin Film for a Flexible Transparent Electrode by Atomic Layer and Molecular Layer Depositions Presentation: Sung Tae Hwang, Korea University, Republic of Korea, 1 slide